課程名稱 |
半導體製程中的輸送現象 Transport phenomena in semiconductor manufacturing |
開課學期 |
113-1 |
授課對象 |
重點科技研究學院 奈米工程與科學博士學位學程 |
授課教師 |
李 雨 |
課號 |
AM7191 |
課程識別碼 |
543EM5440 |
班次 |
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學分 |
3.0 |
全/半年 |
半年 |
必/選修 |
選修 |
上課時間 |
星期二5,6,7(12:20~15:10) |
上課地點 |
應109 |
備註 |
本課程以英語授課。 總人數上限:54人 |
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課程簡介影片 |
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核心能力關聯 |
核心能力與課程規劃關聯圖 |
課程大綱
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課程概述 |
A sequence of processes, including oxidation, photolithography, etching, doping, deposition and planarization on a wafer, performed in a clean-room environment, are involved in semiconductor manufacturing. All these processes, as well as the formation of the single-crystal ingot (wafers are sliced from it) and the clean-room design, are related to the transport phenomena of momentum (fluid mechanics), heat, and mass (including particulate matter). Understanding those transport phenomena is crucial for better design of the processes and products. The theme of this course is to study the transport phenomena in details of these processes, from the viewpoint of fluid mechanics. As the critical dimension of the semiconductor product decrease, mechanics in nano-scales related to the processes will also be addressed. Also discussed in the course is the environmental impact arising from the chemical wastes and resource consumption (energy and water) in semiconductor manufacturing. |
課程目標 |
The goal of this course is to provide students knowledges of the transport phenomena for the processes in semiconductor manufacturing, which is helpful for a better design of application. |
課程要求 |
The students who take this course for credit should have certain knowledges in differential equations, fluid mechanics, and heat transfer. |
預期每週課後學習時數 |
10 hours |
Office Hours |
每週三 14:00~15:30 每週一 12:30~14:00 |
指定閱讀 |
Lecture notes, will be posted on NTUCOOL before the class. |
參考書目 |
(1) Gary S. May and Simon M. Sze, “Fundamentals of semiconductor fabrication,” Wiley, 2004.
(2) Gary S. May and Costas J. Spanos, "Fundamentals of semiconductor manufacturing and process control,” John Wiley and Sons, Inc., 2006.
(3) S. M. Sze and M. K. Lee, “Semiconductor Devices: Physics and Technology,” 3rd ed., John Wiley & Sons, Inc., 2012.
(4) MKS Instruments Handbook 2nd. Edition. Available from the website "https://www.mks.com/mks-handbook".
(5) Frank M. White, “Viscous fluid flow,” 3rd ed., McGraw-Hill, 2006.
(6) R. Byron Bird, Warren E. Stewart, and Edwin N, Lightfoot, “Transport phenomena,” 2nd ed., John-Wiley & Sons, Inc., 2002.
(7) Sheldon K, Friedlander, “Smokes, dusts, and haze – Fundamentals of aerosol dynamics,” 2nd ed., Oxford University Press, 2000.
(8) Jacob N. Israelachvilli, “Intermolecular and surface forces,” 3rd ed., Academic press, 2011. |
評量方式 (僅供參考) |
No. |
項目 |
百分比 |
說明 |
1. |
Homework |
50% |
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2. |
Final Report |
50% |
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針對學生困難提供學生調整方式 |
上課形式 |
提供學生彈性出席課程方式 |
作業繳交方式 |
延長作業繳交期限 |
考試形式 |
書面(口頭)報告取代考試 |
其他 |
由師生雙方議定 |
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週次 |
日期 |
單元主題 |
第1週 |
9/3 |
Introduction to semiconductor manufacturing, and the related transport phenomena. |
第2週 |
9/10 |
Introduction to semiconductor manufacturing, and the related transport phenomena. |
第3週 |
9/17 |
Holiday (Mid-autumn festival), No class this week. |
第4週 |
9/24 |
Environmental set-up for semiconductor manufacturing |
第5週 |
10/1 |
Theory of particle filtration |
第6週 |
10/8 |
Crystal growth |
第7週 |
10/15 |
Photolithography |
第8週 |
10/22 |
Spin coating |
第9週 |
10/29 |
Film formation, Thermal oxidization |
第10週 |
11/5 |
Film deposition - Chemical and Physical vapor deposition (CVD and PVD) |
第11週 |
11/12 |
Etching |
第12週 |
11/19 |
Impurity doping – Diffusion |
第13週 |
11/26 |
Impurity doping – Ion-Implantation |
第14週 |
12/3 |
Planarization – Chemical Mechanical Polishing (CMP)
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第15週 |
12/10 |
Conclusion - with brief discussion on nanomechanics and environmental impact of the semiconductor manufacturing |
第16週 |
12/17 |
Official final examination week (Final report due 23:59, 20th, December, 2024) |
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