課程名稱 |
積體電路工程 Integrated Circuit Technology |
開課學期 |
99-2 |
授課對象 |
電機資訊學院 光電工程學研究所 |
授課教師 |
王維新 |
課號 |
EE5114 |
課程識別碼 |
921EU7120 |
班次 |
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學分 |
3 |
全/半年 |
半年 |
必/選修 |
選修 |
上課時間 |
星期三2,3,4(9:10~12:10) |
上課地點 |
電二102 |
備註 |
本課程以英語授課。 總人數上限:40人 |
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課程簡介影片 |
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核心能力關聯 |
本課程尚未建立核心能力關連 |
課程大綱
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為確保您我的權利,請尊重智慧財產權及不得非法影印
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課程概述 |
1. Crystal and Epitaxial Growth
2. Diffusion
3. Ion Implantation
4. Oxidation of Silicon
5. Thin-Film Deposition
6. Etching and Cleaning
7. Lithography
8. Measurement
9. Silicon Integrated Circuits
10.Packaging |
課程目標 |
In this course, the basic principles underlying the fabrication of semiconductor devices and integrated circuits are discussed. The emphases are on process that are especially useful for integration schemes; however, many processes used for discrete devices will also be included.
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課程要求 |
Prerequisite: General Physics, Engineering Mathematics (I), Electronics (I)
Grading: midterm exam 40%, final exam 40%, homework 20%
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預期每週課後學習時數 |
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Office Hours |
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指定閱讀 |
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參考書目 |
Textbook: Lecture notes will be sent by e-mail.
Reference: [1] A. B. Glaser and G. E. Subak-Sharpe, Integrated Circuit Engineering.
[2] S. K. Ghandhi, VLSI Fabrication Principles.
[3] S. M. Sze, VLSI Technology.
[4] S. M. Sze, Semiconductor Devices, Physics, and Technology.
[5] M. Quirk and J. Serda, Semiconductor Manufacturing Technology.
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評量方式 (僅供參考) |
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